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Hitachi High-Technologies and Picosun Oy Launch a Collaboration in Plasma-enhanced ALD

Hitachi High-Technologies Corp. and Picosun Oy announce a technological cooperation in plasma-enhanced atomic layer deposition (PE-ALD). The aim of this cooperation is to bring thin film coating technologies to a completely new level. Hitachi High-Tech’s and Picosun’s joint breakthrough, the novel Microwave Electron Cyclotron Resonance (ECR) ALD technology will disrupt all advanced semiconductor industries.
In the PE-ALD reactor, Hitachi High-Tech’s powerful ECR plasma generator is integrated with Picosun’s industry-proven, digitally controlled ALD system. Consequently, the quality of the deposited materials is substantially better, and the deposition process is much more precise than existing traditional ALD and plasma-enhanced ALD methods.
Some superior results for various nitride and oxide films have been confirmed with 300 mm semiconductor wafers so far and some other process applications are under evaluation.

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