Gigaphoton Announces a New Model of ArF Excimer Light Source: the GT65A
Gigaphoton Inc, a manufacturer of light sources used in lithography, announced the GT65A, a new ArF excimer light source intended for use in cutting-edge immersion lithography. The new product is scheduled to ship in 2017.
The GT65A supports sub 10 nm lithography processes by further evolving the spectral control technologies for which the Gigaphoton ArF platform is known. The GT65A comes equipped with environmental impact reducing technologies that include Helium-free operation under all operating conditions and compatibility with hTGM, the company’s Neon gas recycling systems.
Regarding spectral control of the GT65A, it comes standard-equipped with two new technologies. The first of these is “eMPL Solid,” which improves spectral performance stability at a level 400% higher than with existing functionality. eMPL Solid achieves an impressively high level of spectral width (E95) stability at ±5 fm in each exposure field, contributing to improved uniformity in critical dimensions (CD). The other new technology is “hMPL,” which controls E95 by keeping them between 200 and 450 fm. hMPL contributes to maximizing the process window by optimizing E95 according to lithography process.
And Gigaphoton’s Helium free and hTGM technologies, which come standard on the GT65A, have been developed in line with Gigaphoton’s EcoPhoton program. These technologies not only reduce environmental impact, but also drastically reduce the risks of future Helium and Neon gas supply shortages and price hikes, thereby Gigaphoton commits providing better sustainability for customers as well.