To make MEMS cost-effective enough for mass produced commercial products, they need to be integrated with analog/mixed signal circuitry, have high yield and have low cost per die. To achieve this goal, you need a toolset that was developed specifically for MEMS and IC design and has the proven capabilities to assist in achieving high yield.

Tanner EDA’s L-Edit™ MEMS Design not only makes integration of MEMS devices with analog/mixed-signal processing circuitry easy but also gives you the tools you need to improve the manufacturability of your MEMS devices. To shorten your design cycle, this leading MEMS and analog/mixed signal IC design tool for the Windows® and Linux® platforms enables you to get started with minimal training.

L-Edit MEMS Design has advanced design rule checking to allow you to easily find design flaws and improve yield. Since most MEMS processes are very specialized or proprietary, you can easily setup rules with its graphical interface, making it configurable for any technology.

To shorten your verification time, L-Edit MEMS Design speeds the process with an advanced Verification Error Navigator that takes you instantly to the location of a violation in the layout editor and provides a clear and thorough summary report of DRC results.

FEATURES & BENEFITS

• Work in the format that mask shops use.
• Import DXF with boundary reconstruction and export GDSII for mask generation to reuse legacy data.
• Avoid confusion and errors on clear and dark field masks when mask shops convert DXF.
• Display the clear and dark fields of the masks easily in L-Edit MEMS Design and see in real-time what your curved geometry will look like when approximated for fabrication.
• Draw filled polygons for your masks instead of estimating it with zero-width line used by mechanical drafting programs.
• UPI and T-Cells
• Create parameterized cells called T-Cells™ consisting of user-defined input parameters and layout-generating code to create complex MEMS structures.
• Create, place, and align MEMS structures with L-Comp™, a set of high-level composition functions that provide a simple toolkit for creating T-Cell code.

• All Angle and Curved Design Rule Checking
• Perform checks for minimum spacing or overlap between objects on various layers.
• Support for an unlimited number of width, spacing, surround, enclose, extension, overlap, not exist, and density rules.
• High performance boolean and select operations work on all-angled and curved geometry.
• Create complex DRC rules that are customized to meet proprietary MEMS fabrication processes.
• Perform recommended checks to increase yield.
• Display DRC violations in real time while you edit your layout with Interactive DRC, helping you create error-free layouts the first time.

SYSTEM REQUIREMENTS

• Microsoft® Windows XP, Windows Vista™
• Intel® Pentium® 4 processor or Pentium 4 equivalent with SSE support
• 1280 x 1024 Resolution—True Color (24-bit)
• 3 button mouse

APPLICATION AREAS

Audio, Automotive, Consumer Products, Defense, Industrial, Security, Telecommunications, Wireless, MEMS, Sensors

Contact Information

Tanner EDA

825 S. Myrtle Avenue
Monrovia, CA, 91016
USA

tele: +1.626.471.9700
toll-free: 877.325.2223
fax: +1.626.471.9800
sales@tanner.com
www.tannereda.com