In today’s MEMS design world, integration is more important than ever. To compete in a high-efficiency, high-productivity marketplace, you need a toolset that has proven its ability to accelerate the design cycles of commercially successful projects.

Tanner EDA’s L-Edit™ meets your needs because it is the only tool developed specifically for MEMS and IC design. L-Edit makes integration of MEMS devices with analog/mixed-signal processing circuitry easy with powerful features that exceed the needs of the most demanding user. This leading MEMS and analog/mixed signal IC design tool for the Windows® and Linux® platforms enables you to get started with minimal training.

Since L-Edit shows clear and dark fields of the masks as opposed to other CAD tools designed for mechanical engineering, you can quickly draw and edit masks and easily view different combination of masks to examine their overlaps and interactions. Using powerful features such as excellent curve support, interactive DRC, boolean operations, object snapping, and alignment, you can work more efficiently to save time and money.

L-Edit gives you greater precision by enabling you to perform complex Boolean and derived layer operations with polygons of arbitrary shape and curvature. Perform AND, OR, XOR, Subtract, Grow, and Shrink on groups of objects. This allows you to quickly create entire complex curved shapes for MEMS from just a few easily drawn objects.

FEATURES & BENEFITS

• ECreate layout with precision
• Perform complete hierarchical physical layout with all-angle polygons, curved polygons and torii.
• Use orthogonal, 45°, all-angle, and curved drawing modes.
• Speed drawing and editing by snapping the cursor to object vertices, edges, midpoints, center points, and instances.
• Perform one-click horizontal or vertical object alignment, equally space objects, or tile objects horizontally, vertically, or in a 2D array.
• Specify a reference point for precision editing operations such as object rotation, flip, move, or instance placement using the base point feature.
• Quickly change grid sizes with the Multi-grid toolbar when switching between MEMS and IC layout.
• Perform default property computations for built-in devices or create user code to compute custom properties from a set of pin and auxiliary layers.

• Work in a versatile environment
• Import DXF with boundary reconstruction and export GDSII for mask generation to reuse legacy data.
• Create low cost, high resolution transparency MEMS masks with L-Edit’s PostScript mask export.
• Features designed just for MEMS
• Draw curved geometry and edit it as a curve with L-Edit’s true curved polygon representation.
• Use the built-in manufacturing grid to see in real-time what your curved geometry will look like when approximated for fabrication.
• Import DRC results from a Calibre DRC results file for viewing in L-Edit.
• Add fillets easily to geometry to reduce mechanical stress at corners.

SYSTEM REQUIREMENTS

• Microsoft® Windows XP, Windows Vista™
• Intel® Pentium® 4 processor or Pentium 4 equivalent with SSE support
• 1280 x 1024 Resolution—True Color (24-bit)
• 3 button mouse

INDUSTRIES SERVED

Audio, Automotive, Consumer Products, Defense, Industrial, Security, Telecommunications, Wireless MEMS, Sensors

Contact Information

Tanner EDA

825 S. Myrtle Avenue
Monrovia, CA, 91016
USA

tele: +1.626.471.9700
toll-free: 877.325.2223
fax: +1.626.471.9800
sales@tanner.com
www.tannereda.com